Effects of Organic Compounds on Microstructure, Optical, and Electrical Properties of ITO Thin Films Prepared by Dip-Coating Method

Table 1

Main characteristics of the prepared ITO thin films.

Annealing conditions	Carbon content^a (weight%)	FWHM^b (Degree)	Crystal size^b (nm)	Conductivity^c (S/cm)
Without annealing	8.15	2.5	3.3	0.3×10^1
Annealed at 400°C	4.90	2.3	3.9	0.8×10^1
Annealed at 600°C	0.00	1.9	4.5	2×10^1

^aBy EDS.
^bBy XRD.
^cBy 4-point probe.