Characteristics and Photocatalytic Properties of <svg style="vertical-align:-4.50008pt;width:44.5px;" id="M1" height="21.0375" version="1.1" viewBox="0 0 44.5 21.0375" width="44.5"  xmlns="http://www.w3.org/2000/svg">
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</svg> Thin Film Prepared by Sputter Deposition and Post-N<sup  >+</sup> Ion Implantation

<table>AFM top-view images of the unirradiated A-, R-, and M-TiO<sub>2</sub> thin film (a) and the irradiated A-, R-, and M-TiO<sub>2</sub> thin film with an <svg height="14.2625" id="M16" style="vertical-align:-0.12283pt" version="1.1" viewbox="0 0 20.362499 14.2625" width="20.362499" xmlns="http://www.w3.org/2000/svg" xmlns:xlink="http://www.w3.org/1999/xlink">
<g transform="matrix(.017,0,0,-.017,.062,14.05)"><path d="M719 650v-28q-43 -2 -62 -15t-22 -44q-6 -47 -6 -169v-403h-31l-426 524h-2v-251q0 -111 6 -169q4 -37 24 -50.5t72 -16.5v-28h-237v28q45 2 64.5 16t23.5 49q6 62 6 171v220q0 54 -3 68.5t-17 32.5q-16 19 -34.5 26.5t-54.5 10.5v28h147l418 -502h3v246q0 117 -7 166
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</svg> ion dose of 5.0 × 10<sup>15</sup> ions/cm<sup>2</sup> (b).</table>

Advances in Materials Science and Engineering

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Figure 2

Figure 2: Characteristics and Photocatalytic Properties of <svg style="vertical-align:-4.50008pt;width:44.5px;" id="M1" height="21.0375" version="1.1" viewBox="0 0 44.5 21.0375" width="44.5"  xmlns="http://www.w3.org/2000/svg">
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Figure 2 | Characteristics and Photocatalytic Properties of 
	
		
			
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Advances in Materials Science and Engineering

Characteristics and Photocatalytic Properties of T i O 2 Thin Film Prepared by Sputter Deposition and Post-N+ Ion Implantation

Figure 2

Characteristics and Photocatalytic Properties of Thin Film Prepared by Sputter Deposition and Post-N⁺ Ion Implantation