Research Article
A Study of Thin Film Resistors Prepared Using Ni-Cr-Si-Al-Ta High Entropy Alloy
Figure 3
X-ray diffraction patterns of Ni-Cr-Si-Al-Ta thin films with different sputtering powers: (a) as-deposited and annealed at (b) 500°C.
| (a) |
| (b) |
| (a) |
| (b) |