Effects of High Magnetic Field Postannealing on Microstructure and Properties of Pulse Electrodeposited Co-Ni-P Films

<div>Dependence of the Nanohardness and Young’s modulus on the magnetic flux density (<svg height="8.68572pt" id="M23" style="vertical-align:-0.0498209pt" version="1.1" viewbox="-0.0498162 -8.6359 7.94191 8.68572" width="7.94191pt" xmlns="http://www.w3.org/2000/svg" xmlns:xlink="http://www.w3.org/1999/xlink"><g transform="matrix(.013,0,0,-0.013,0,0)"><path d="M578 512C578 619 494 650 387 650H140L134 622C219 615 223 609 210 542L127 119C112 40 104 34 23 28L17 0H235C317 0 387 7 444 33C515 65 564 122 564 195C564 289 495 335 412 352V354C505 373 578 422 578 512ZM486 510C486 422 423 367 314 367H257L294 565C299 591 305 602 315 608C324 614 339 617 362 617C421 617 486 595 486 510ZM466 200C466 100 393 35 296 35C222 35 198 51 212 127L250 333H303C388 333 466 303 466 200Z" id="g113-67"></path><glyph.data ascent="3473" descent="-2876" horiz-adv-x="601" vert-adv-y="601"></glyph.data></g></svg>) applied for Co-Ni-P films during annealing.</div>

Advances in Materials Science and Engineering

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Figure 3

Figure 3: Effects of High Magnetic Field Postannealing on Microstructure and Properties of Pulse Electrodeposited Co-Ni-P Films 