Topographical and Physicochemical Contrast in Photopatterned SU-8 Films for Microfabrication of Multilayer Structures

Figure 1

Optical images of Microposit on PEB SU-8 2050 (a) before development (b) after development. Inset shows the mask employed for UV exposure. Figures (c) and (d) represent an isometric view of the sample.