Topographical and Physicochemical Contrast in Photopatterned SU-8 Films for Microfabrication of Multilayer Structures

Table 1

Conditions for deposition and lithography of each layer.

	Spin max speed; (RPM)	SB	PEB	HB	Exposure	Dose	Development time; (s)
SU-8 2001	3000	60 s at 65°C & 60 s at 95°C	SB	15 min at 200°C	Mask	162	60
SU-8 2010	3500	60 s at 65°C & 180 s at 95°C	SB	15 min at 200°C	Mask	189	180
SU-8 2050	4000	180 s at 65°C & 240 s at 95°C	SB	15 min at 200°C	Mask	324	300
AZ-9260	2500	210 s at 105°C	None	None	Flood	128	210
Microposit S1400-31	5500	180 s at 95°C	None	None	Flood	108	45