Research Article

Computer Simulation of Metal Ions Transport to Uneven Substrates during Ionized Plasma Vapour Deposition

Table 2

Parameters and results of global model.

ParameterValues

 cm−3
400 K
5.3 Pa (40 mTorr)
RF 100 W400 W700 W1000 W
 cm−3 cm−3 cm−3 cm−3
1.47 eV1.46 eV1.44 eV1.42 eV
 cm−3 cm−3 cm−3 cm−3
 cm−3 cm−3 cm−3 cm−3

of particle model; parameter; from [23]; of global model.