[Retracted] Fabrication of Hollow Needle Tips with Nanoholes by Plasma Maskless Processing and Calculation and Detection of Complex Surface Edges

Table 2

Ni film stripping process parameters and thickness.

Sputtering power(w)	120	100	0	80	0	0	0	0
Sputtering time (min)	30	40	60	40	50	60	80	99
Film thickness (nm)	90	130	160	90	130	140	200	230
Ultrasonic wash time (s)	Not stripped	20	Partly stripped	10	20	60	30	10