Continuously Varying Thickness Interference Bandpass Filter for the Visible Spectral Range: Using Ion Beam Sputter Deposition

Table 5

Deposition parameters for Nb₂O₅ and SiO₂ films [22].

	Nb2O5	SiO2
Target material	99.95% pure Nb	99.99% pure S
Sputtering gas	Ar^+	Ar^+
Sputtering gas flow	4 sccm	4 sccm
Sputtering gas ion energy	800 eV	800 eV
Sputtering gas ion flux	75 mA	75 mA
Sputtering angle	60°	60°
Substrate tilt angle	45°	45°
Substrate rotation	60 rpm	60 rpm
Reactive gas	O^+	O^+
Reactive gas flow	10 sccm	10 sccm
Reactive gas ion energy	200 eV	200 eV
Reactive gas ion flux	∼2.5 mA	∼2.5 mA