Incoming Work-In-Progress Prediction in Semiconductor Fabrication Foundry Using Long Short-Term Memory

Table 4

Parameter size selection results.

Combination	Parameter				RMSE
	Epoch	Batch size	LSTM hidden layers stacked	LSTM neuronsize
1	100	10	3	512, 8, 8	0.0096
2	100	10	3	512, 8, 16	0.0086
3	100	20	3	512, 16, 16	0.0091