Fabrication and Photovoltaic Characteristics of Coaxial Silicon Nanowire Solar Cells Prepared by Wet Chemical Etching

Figure 2

SEM images of various SNW/p-Si(100) structures. Etching conditions were aqueous AgNO₃/HF/H₂O mixture chemical solution in a ratio of (a) 2 : 34 : 164, (b) 4 : 34 : 162, (c) 6 : 34 : 160, and (d) 8 : 34 : 158 (volume) at 25°C for 10 min. The concentration of AgNO₃ was 1 mol L⁻¹.

(a)

(b)

(c)

(d)