Fabrication and Photovoltaic Characteristics of Coaxial Silicon Nanowire Solar Cells Prepared by Wet Chemical Etching

Figure 3

SEM images of various SNW/p-Si(100) structures. Etching conditions were aqueous AgNO₃/HF/H₂O mixture chemical solution in a ratio of (a) 4 : 31 : 165, (b) 4 : 38 : 158, and (c) 4 : 41.5 : 154.5 (volume) at 25°C for 10 min. The concentration of AgNO₃ was 1 mol L⁻¹.

(a)

(b)

(c)