Fabrication and Photovoltaic Characteristics of Coaxial Silicon Nanowire Solar Cells Prepared by Wet Chemical Etching
Figure 5
Top morphologies of SNW/p-Si(100) structure, magnified at (a) ×10k, and (b) ×50k. Etching conditions were aqueous AgNO3/HF/H2O mixed chemical solution in a ratio of 4 : 34 : 162 (volume) at 25°C for 3 min. Cross-sections of SNW arrays had non-regular morphologies and sizes from 300 to 1000 nm.
