Surface Passivation and Antireflection Behavior of ALD TiO₂ on n-Type Silicon for Solar Cells

Figure 2

SEM images of TiO₂ thin films at different growth temperatures: (a) 200°C, (b) 300°C, (c) 400°C, and (d) 500°C.

(a)

(b)

(c)

(d)