Improvement in Device Performance and Reliability of Organic Light-Emitting Diodes through Deposition Rate Control
Figure 3
(a) Normalized luminance () and (b) voltage variation () versus operating time of five types of OLED structure. The last 5 nm Bebq2 layer prepared with a two-step process (device A, 0.03 nm/s and device B, 0.3 nm/s) on bulk Bebq2 (55 nm and 1.3 nm/s). The reference devices were used at the constant deposition rates of 1.3 (device C), 0.3 (device D), and 0.03 (device E) nm/s in bulk Bebq2 EML/ETL (60 nm). All devices were driven with constant current density of 100 mA/cm2.
