Improvement in Device Performance and Reliability of Organic Light-Emitting Diodes through Deposition Rate Control
Figure 4
The atomic force microscope micrographs of Bebq2 (5 nm) films prepared with different deposition rates of (a) 0.03, (b) 0.3, and (c) 1.3 nm/s on the bulk material of Bebq2 (55 nm; 1.3 nm/s) substrate. The depth profiles of ultrathin Bebq2 with three deposition rates of 0.03 (d), 0.3 (e), and 1.3 (f) nm/s were extracted from the centerline of corresponding images.
