The Role of Silicon Heterojunction and TCO Barriers on the Operation of Silicon Heterojunction Solar Cells: Comparison between Theory and Experiment

Table 4

(a) Gas flow rates of silane () and 2% TMB in H₂ () used for the deposition of p-a-Si:H, and the corresponding flow ratios and TMB % in SiH₄ in the gas mixture. The H₂ flow rate () was kept constant

Split name		Gas flow rates (sccm)			TMB % in SiH4
		2% TMB in H2 ()	Silane ()
TMB 50/50	Reference 1	50	50	1	2
TMB 10/50	Low doping 1	10	50	0.2	0.4
TMB 10/75	Low doping 2	10	75	0.13	0.27
TMB 10/100	Low doping 3	10	100	0.1	0.2

(b) Summary of the lowest, average, and best light I-V parameters of cells from the different splits of a-Si:H(p) devices

Split		Short-circuit current density, (mA/cm^2)	Open-circuit voltage, (mV)	Fill factor, (%)	Efficiency, (%)
TMB 50/50	Lowest	35.1	729.5	76.8	19.7
	Avg	35.2	733	78.1	20.1
	Best	35.4	735	79.1	20.6
TMB 10/50	Lowest	34.9	738	65.7	16.9
	Avg	35.2	741	66.8	17.5
	Best	35.5	742	67.9	17.9
TMB 10/75	Lowest	35.0	705.8	66.7	16.5
	Avg	35.0	714	66.2	16.5
	Best	35.2	712	67.0	16.8
TMB 10/100	Lowest	35.3	702.3	66.1	16.4
	Avg	35.3	715	65.7	16.5
	Best	35.3	720	65.7	16.7