Research Article
Study on the Influence of Introducing Al Transition Layer on Deuterium Resistance of Al2O3 Coating
Table 1
The specific process parameters of coating preparation by radio-frequency magnetron sputtering.
| Process parameters | Coating | Al | Al2O3 |
| Target type | Metal | Ceramic | The target diameter (mm) | 101.5 | 101.5 | The target-substrate distance (mm) | 75 | 75 | The base pressure (Pa) | | | The sputtering power (W) | 250 | 350 | The sputtering power density (W·cm-2) | 4.98 | 6.67 | Coating deposition pressure (Pa) | 0.5 | 0.5 | Sputtering atmosphere and flow (sccm) | | | Coating deposition time (h) | 0.5 | 6 |
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