Research Article

Study on the Influence of Introducing Al Transition Layer on Deuterium Resistance of Al2O3 Coating

Table 1

The specific process parameters of coating preparation by radio-frequency magnetron sputtering.

Process parametersCoating
AlAl2O3

Target typeMetalCeramic
The target diameter (mm)101.5101.5
The target-substrate distance (mm)7575
The base pressure (Pa)
The sputtering power (W)250350
The sputtering power density (W·cm-2)4.986.67
Coating deposition pressure (Pa)0.50.5
Sputtering atmosphere and flow (sccm)
Coating deposition time (h)0.56