Mechanism and Optimized Process Conditions of Forming One-Dimensional ZnO Nanorods with Al-Doping by Electrodeposition Method

Figure 3

SEM images of ZnO films formed on FTO substrates by electrodeposition method at a constant potential -1.5 V from 3 mM Zn(NO₃)₂ aqueous solutions containing Al(NO₃)₃ with different Al³⁺/Zn²⁺ ratio in the bath: (a) 0 at%, (b) 1 at%, (c) 2 at%, and (d) 3 at%, at 80°C for 60 min with a fixed electrode distance 2 cm.

(a)

(b)

(c)

(d)