Microphase Separation of a PS-b-PFS Block Copolymer via Solvent Annealing: Effect of Solvent, Substrate, and Exposure Time on Morphology

Figure 1

AFM topography (a) and phase (b) images of PS-b-PFS thin films on Si substrates prepared from 1.0 wt.% solution of the polymer in toluene prior to any annealing.

(a)

(b)