Assessing the Oxidative Degradation of N-Methylpyrrolidone (NMP) in Microelectronic Fabrication Processes by Using a Multiplatform Analytical Approach

<div>(a) Variation of the pH of NMP with time and upon use in the photolithography lift-off process under standard operating conditions (aerial atmosphere) using a Veeco PSP M3303 Trilennium solvent processor. (b) Concentration of various elements within the WIP wafer build in NMP over the course of its lifetime in the photolithography lift-off process under standard operating conditions + N<sub>2</sub> blanket. WIP rate of 5000 wafer per month. (c) pH of NMP over its lifetime in the photolithography lift-off process under standard operating conditions + N<sub>2</sub> blanket. WIP rate of 5000 wafer per month. (d) Variation of NMP pH under oxygen-rich and nitrogen-rich conditions in the presence of Co-Na Y-52 zeolite at 80°C.</div>

Journal of Analytical Methods in Chemistry

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Figure 2: Assessing the Oxidative Degradation of N-Methylpyrrolidone (NMP) in Microelectronic Fabrication Processes by Using a Multiplatform Analytical Approach 

Figure 2 | Assessing the Oxidative Degradation of N-Methylpyrrolidone (NMP) in Microelectronic Fabrication Processes by Using a Multiplatform Analytical Approach 