Assessing the Oxidative Degradation of N-Methylpyrrolidone (NMP) in Microelectronic Fabrication Processes by Using a Multiplatform Analytical Approach

Table 1

Impurity profile by LC/UV.

Sample	∼RT (min)	∼RRT	Area %
Nitrogen filled	2.27 (NMS)	0.67	2.8
	3.11	0.92	4.3
	4.49	1.33	0.6
Oxygen filled	0.91	0.27	1.1
	2.28 (NMS)	0.67	15.0
	3.10	0.92	10.5
	3.92	1.16	11.4
	5.14 (split peak)	1.52	2.1
	6.15	1.82	1.5

RT: retention time, RRT: relative retention time to NMP, NMS: N-methylsuccinimide.