A Novel Approach for Fabricating LaMnO<sub>3</sub> Thin Films Using Combined Microwave Combustion and Pulsed Electron Deposition Techniques

<div>XRD patterns of the LaMnO<sub>3</sub> thin films prepared with different O<sub>2</sub> flux at 0, 5, 15, and 25 sccm after annealing at 800°C for 2 h.</div>

Journal of Chemistry

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Figure 8

Figure 8: A Novel Approach for Fabricating LaMnO<sub>3</sub> Thin Films Using Combined Microwave Combustion and Pulsed Electron Deposition Techniques 

Journal of Chemistry

A Novel Approach for Fabricating LaMnO3 Thin Films Using Combined Microwave Combustion and Pulsed Electron Deposition Techniques

Figure 8

A Novel Approach for Fabricating LaMnO₃ Thin Films Using Combined Microwave Combustion and Pulsed Electron Deposition Techniques