A Novel Approach for Fabricating LaMnO₃ Thin Films Using Combined Microwave Combustion and Pulsed Electron Deposition Techniques

Table 3

The lattice parameters of the LaMnO₃ thin films deposited at 14 and 15 kV after annealing at 800°C for 2 h.

Sample	Lattice structure	a (Å)	b (Å)	c (Å)	Volume of unit cell (Å^3)
15 kV at 800°C	Hexagonal	5.46	5.46	13.44	358.03
14 kV at 800°C	Hexagonal	5.49	5.49	13.26	346.24