The Influences of Thickness on the Optical and Electrical Properties of Dual-Ion-Beam Sputtering-Deposited Molybdenum-Doped Zinc Oxide Layer

Table 2

Conditions and ion beam settings for MZO deposition.

Parameter	Composition, setting
Target material	4N ZnO/MoO3 (97/3 wt%)
Working pressure (Pa)	0.67
Substrate temperature (°C)	130
Film growth rate (nm/s)	0.05
Assistant ion beam
Discharge voltage (V)	100
Discharge current (A)	1.4
Film thickness (nm)	80, 100, 120, 140, 160, 180, 200