Patterning Luminescent Nanocrystalline : Eu and : Tb Particles Embedded in Hybrid Organosilica with Soft-Lithographic Techniques
Figure 4
SEM images showing the effects of various processing variables in μTM (a) removal of the excess material in a direction parallel to the lines results in M-shaped lines; (b) application of strong force during the removal of excess material may result in incomplete filling of features of the mould; (c) reservoir (bulk) of excess material at the edge of the patterned lines resulting from incomplete removal of excess solution.
