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<table>XRD patterns of Ag-TiO<sub>2</sub> films on silicon substrate (a) as-deposited and annealed at 900°C  for (b) 15, (c) 30, (d) 60, (e) 90, and (f) 120 min. </table>

Journal of Nanomaterials

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Journal of Nanomaterials

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Influence of Annealing and UV Irradiation on Hydrophilicity of Ag- Nanostructured Thin Films