Optimization of the Electrodeposition Parameters to Improve the Stoichiometry of <svg xmlns:xlink="http://www.w3.org/1999/xlink" xmlns="http://www.w3.org/2000/svg" style="vertical-align:-4.67647pt;width:46.599998px;" id="M1" height="20.6" version="1.1" viewBox="0 0 46.599998 20.6" width="46.599998">
	
		
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</svg> Films for Solar Applications Using the Taguchi Method

<table>Glancing angle X-ray diffraction spectra for as-grown and annealed (in air at 250°C) In<sub>2</sub>S<sub>3</sub> film.</table>

Journal of Nanomaterials

fig7

Figure 7

Figure 7: Optimization of the Electrodeposition Parameters to Improve the Stoichiometry of <svg xmlns:xlink="http://www.w3.org/1999/xlink" xmlns="http://www.w3.org/2000/svg" style="vertical-align:-4.67647pt;width:46.599998px;" id="M1" height="20.6" version="1.1" viewBox="0 0 46.599998 20.6" width="46.599998">
	
		
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"></path></g>

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</svg> Films for Solar Applications Using the Taguchi Method 

Figure 7 | Optimization of the Electrodeposition Parameters to Improve the Stoichiometry of 
	
		
			

			

			

			

		
	
 Films for Solar Applications Using the Taguchi Method 

Journal of Nanomaterials

Optimization of the Electrodeposition Parameters to Improve the Stoichiometry of Films for Solar Applications Using the Taguchi Method

Figure 7