Large-Area Resonance-Tuned Metasurfaces for On-Demand Enhanced Spectroscopy

Figure 2

Schematic of lateral tuning in NIL. Top: status just after removing the nanoimprint mold. Middle: less-optimum treatment of residual thin film of resist. The aperture width is smaller than the initial width . Bottom: overoptimum treatment of residual thin film of resist. The aperture width is larger than the initial width . The treatment of the residual film was carried out by dry etching using mixed O₂ and N₂ gas plasma.