Dynamic Deposition of Nanocopper Film on the β-SiC_p Surface by Magnetron Sputtering

Table 1

The parameters of β-SiC particles and experimental parameter were listed.

Specimen	Sputtering time	Substrate temperature	Sputtering power
S1	30 min	25°C	370 W
S2	60 min	25°C	370 W
S3	90 min	25°C	370 W
S4	60 min	150°C	370 W
S5	60 min	250°C	370 W
S6	60 min	25°C	270 W
S7	60 min	25°C	440 W