Spark Plasma Sintered Si₃N₄/TiN Nanocomposites Obtained by a Colloidal Processing Route

Figure 3

XRD analysis of doped powders after thermal treatments. (a) α-Si₃N₄ starting powders doped with Al and Y precursors and thermally treated at 850°C/2 h. (b₁) α-Si₃N₄ starting powders doped with Ti precursor and oxidized at 500°C/2 h. (b₂) The same powders are subjected to a thermal treatment reduction with NH₃ gas at 1000°C/3 h.