Research Article
Spark Plasma Sintered Si3N4/TiN Nanocomposites Obtained by a Colloidal Processing Route
Figure 6
Microstructures by FESEM of dense Si3N4-TiN composites sintered at 1800°C and 100 MPa and the corresponding XRD patterns. (a) Si3N4/TiN dwell 2 min sample, (b) AY-Si3N4/TiN dwell 2 min sample, and (c) AY-Si3N4/TiN dwell 10 min sample (G. phase: glassy phase).
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