Electrodeposition-Based Fabrication and Characteristics of Tungsten Trioxide Thin Film

<div>Absorptance of the WO<sub>3</sub>-coated glass and ITO glass at various values of the process parameters: (a) as-deposited, (b) <svg height="12.2532pt" id="M74" style="vertical-align:-3.29108pt" version="1.1" viewbox="-0.0498162 -8.96212 46.2091 12.2532" width="46.2091pt" xmlns="http://www.w3.org/2000/svg" xmlns:xlink="http://www.w3.org/1999/xlink"><g transform="matrix(.013,0,0,-0.013,0,0)"><path d="M620 675H597C578 656 570 650 541 650H144C112 650 104 653 94 675H72C59 618 42 552 23 493L53 491C71 534 88 564 105 585C124 608 144 615 238 615H290L197 121C182 40 174 34 88 28L82 0H361L367 28C275 34 266 38 281 121L374 615H441C522 615 543 608 553 583C562 560 566 531 565 493L597 494C603 551 612 629 620 675Z" id="g113-85"></path><glyph.data ascent="3473" descent="-2876" horiz-adv-x="637" vert-adv-y="637"></glyph.data></g><g transform="matrix(.0091,0,0,-0.0091,7.176,3.132)"><path d="M490 97L476 124C442 96 405 70 398 70C392 70 390 78 396 114C419 243 448 379 463 432L457 436C446 436 431 439 418 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Journal of Nanomaterials

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Figure 10

Figure 10: Electrodeposition-Based Fabrication and Characteristics of Tungsten Trioxide Thin Film 