Dynamic Interferometry Lithography on a TiO₂ Photoresist Sol-Gel for Diffracting Deflector Module

Figure 12

AFM profiles of double period diffraction grating made by DIL after several cumulative annealing treatments: (a) 2 h at 110°C; (b) (a) + 2 h at 200°C; (c) (b) + 2 h at 300°C; (d) (c) + 2 h at 400°C; (e) (d) + 2 h at 500°C.

(a)

(b)

(c)

(d)

(e)