Dynamic Interferometry Lithography on a TiO₂ Photoresist Sol-Gel for Diffracting Deflector Module

Figure 18

Simulation of the grating efficiency (a) for the −1st order and a grating period of 600 nm, (b) for the −2nd order and a grating period of 600 nm, and (c) for the −1st order and a double grating period 1200 nm/600 nm close to the one obtained after heat treatment at 400°C.