Experimental Investigation on Mechanical Properties of TiAlN Thin Films Deposited by RF Magnetron Sputtering

<table class="table-group" id="tab1"><tr><td><table class="table"><tr><td class="thead-hr" colspan="5"><hr/></td></tr><tr class="thead"><td class="align_left">Sample</td><td class="align_center">100 W-TiAlN</td><td class="align_center">150 W-TiAlN</td><td class="align_center">200 W-TiAlN</td><td class="align_center">250 W-TiAlN</td></tr><tr><td class="thead-hr" colspan="5"><hr/></td></tr><tr><td class="align_left">Hardness (HV)</td><td class="align_center">28.1</td><td class="align_center">30.5</td><td class="align_center">32.1</td><td class="align_center">30.2</td></tr><tr class="table-tr"><td colspan="5"><hr class="tbody-hr"/></td></tr></table></td></tr></table>

<div>Hardness values of TiAlN thin films.</div>

Journal of Nanomaterials

tab1

Table 1

Table 1: Experimental Investigation on Mechanical Properties of TiAlN Thin Films Deposited by RF Magnetron Sputtering 