Experimental Investigation on Mechanical Properties of TiAlN Thin Films Deposited by RF Magnetron Sputtering

<table class="table-group" id="tab3"><tr><td><table class="table"><tr><td class="thead-hr" colspan="5"><hr/></td></tr><tr class="thead"><td class="align_left">Sample</td><td class="align_center">100 W-TiAlN</td><td class="align_center">150 W-TiAlN</td><td class="align_center">200 W-TiAlN</td><td class="align_center">250 W-TiAlN</td></tr><tr><td class="thead-hr" colspan="5"><hr/></td></tr><tr><td class="align_left">Adhesion strength (GPa)</td><td class="align_center">32.1</td><td class="align_center">38.6</td><td class="align_center">41.3</td><td class="align_center">34.3</td></tr><tr class="table-tr"><td colspan="5"><hr class="tbody-hr"/></td></tr></table></td></tr></table>

<div>Elastic modulus values of TiAlN thin films.</div>

Journal of Nanomaterials

tab3

Table 3

Table 3: Experimental Investigation on Mechanical Properties of TiAlN Thin Films Deposited by RF Magnetron Sputtering 