Research Article
Comparative Performance Study of Difference Differential Amplifier Using 7 nm and 14 nm FinFET Technologies and Carbon Nanotube FET
Table 1
The Stanford CNFET model parameters.
| Parameter | Description | Value |
| | Power supply | 0.7 V | | Physical channel length | 16 nm | | CNT pitch | 10 nm | | CNT chirality | (19, 0) | | Mean free path in intrinsic CNT | 200 nm | | N-type CNFET flat band voltage | 0 | | Dielectric material of top gate | HfO2 (16) | | Source-side length of doped CNT | 16 nm | | Drain-side length of doped CNT | 16 nm | | Oxide thickness | 4 nm | | Dielectric constant | SiO2 (4) | | Mean free path in doped CNT | 15 nm | | Fermi level of n+-doped drain/source CNT region | 0.6 eV | | Total number of CNT used per CNFET | ∼ |
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