Research Article

Fabrication of UV Photodetectors Based on Photoelectrochemically Etched Nanoporous Silicon: Effect of Etchants Ratio

Table 1

Variation of (111) peak position, FWHM, crystallite size, and strain as a function of chemical ratio (HF:C2H6O:H2O2).

Chemical ratio (HF:C2H6O:H2O2)2θ (°)FWHM (°)Crystallite size (nm)Strain (%)

(1 : 1 : 0)28.44770.787210.870.0136
(1 : 3 : 0)28.44440.590414.380.0103
(2 : 1 : 1)28.45760.590414.510.0102