Fabrication of UV Photodetectors Based on Photoelectrochemically Etched Nanoporous Silicon: Effect of Etchants Ratio

Table 1

Variation of (111) peak position, FWHM, crystallite size, and strain as a function of chemical ratio (HF:C₂H₆O:H₂O₂).

Chemical ratio (HF:C2H6O:H2O2)	2θ (°)	FWHM (°)	Crystallite size (nm)	Strain (%)
(1 : 1 : 0)	28.4477	0.7872	10.87	0.0136
(1 : 3 : 0)	28.4444	0.5904	14.38	0.0103
(2 : 1 : 1)	28.4576	0.5904	14.51	0.0102