Research Article

Fabrication of UV Photodetectors Based on Photoelectrochemically Etched Nanoporous Silicon: Effect of Etchants Ratio

Table 3

Parameters of the n-PSi-based photodetectors for different chemical ratios (HF:C2H6O:H2O2) and illuminated under a wavelength of 365 nm.

Anodization chemical ratio (HF:C2H6O:H2O2)VBias (V)Id (A)Iph (A)S (%)GR (A/W)ΦB (eV)tRcs (s)tRec (s)

(1 : 1 : 0)34.43 × 10−421 × 10−4347.044.473.270.661.680.89
51.47 × 10−410 × 10−4566.666.800.650.76
71.90 × 10−411 × 10−4748.945.780.770.81

(1 : 3 : 0)39.64 × 10−581.4 × 10−5744.398.444.100.880.650.70
51.22 × 10−536 × 10−52,850.8129.500.590.58
71.47 × 10−510 × 10−4566.666.800.571.40

(2 : 1 : 1)32.21 × 10−562.8 × 10−52,741.6228.419.170.960.550.53
51.81 × 10−5109 × 10−65,922.0960.220.560.25
76.12 × 10−59.91 × 10−561.9211.610.500.45