Research Article
Large-Scale Atmospheric Step-and-Repeat UV Nanoimprinting
Table 2
Imprinting conditions.
| | Spin-coated resin thickness after baking | 120 nm | | Photo-curable resin viscosity | 12,000 mPa·s | | Imprinting pressure | 2 MPa | | Imprinting platen feed velocity | 1 μm/s | Imprinting total UV light exposure
1-cycle UV light exposure time | 360 mJ/cm2
12 s | | RIE process gasses | C4F8, SF6 | | RIE RF power | 500 W | | RIE process time | 180 s |
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