PMMA-Assisted Plasma Patterning of Graphene

Figure 2

Patterning of graphene using a protective mask (PMMA) and exposure to oxygen plasma. Normally, PMMA shows poor resistance to oxygen plasma. The present work proposes novel physical processing parameters to enable the usage of PMMA as a mask to create ribbon patterns on graphene. Electron-beam (e-beam) lithography is used to create the PMMA mask.