Research Article
PMMA-Assisted Plasma Patterning of Graphene
Figure 3
Raman characteristic (514 nm wavelength) of (a) graphene exposed to oxygen plasma (8 Watts, 30 mTorr, 1 sccm, 2 minutes) and (b) pristine graphene. The spectrum was measured on each corner point of a (4 µm)2 square area. The Raman characteristic of plasma-etched graphene corresponds to that of graphene oxide.
| (a) |
| (b) |