Graphene and g-C₃N₄-Based Gas Sensors

Table 3

Advantages and disadvantages of different techniques employed for the fabrication of g-CN films.

Techniques	Advantages	Disadvantages	Ref.
Spin-coating	(i) Large surface area; (ii) Highly adhesive; (iii) Easiest, homogeneity; (iv) Appropriate for deposition on any substrate	(i) High cost for the fabrication; (ii) High cost of precursors; (iii) Needed controlled atmosphere	[49, 50]
CVD	(i) High deposition rate; (ii) Uniform film	(i) Low deposition rates	[49, 51]
RFM-based sputtering deposition	(i) High quality and uniform films, simply controlled sputtering speed, good adhesion; (ii) Useful manipulation, offers large area coatings; (iii) Uniform coating thickness. Compact, pore-free coating. Capability to coat on heat-sensitive substrates	(i) Plasma damage; (ii) Plasma contamination; (iii) Probability of substrate damage due to ionic bombardment	[49, 52]
PVD	(i) Low hydrogen content	(i) Low deposition rate; (ii) Difficult to control film thickness	[51, 53]