The Role of Annealing Treatment on Crystallographic, Optical, and Electrical Features of Bi<sub>2</sub>O<sub>3</sub> Thin Films Prepared Using Reactive Plasma Sputtering Technology

<div>Bi<sub>2</sub>O<sub>3</sub> sample XRD pattern (S1, S2, S3, and S4) preannealing treatment.</div>

Journal of Nanotechnology

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Figure 3: The Role of Annealing Treatment on Crystallographic, Optical, and Electrical Features of Bi<sub>2</sub>O<sub>3</sub> Thin Films Prepared Using Reactive Plasma Sputtering Technology 

Figure 3 | The Role of Annealing Treatment on Crystallographic, Optical, and Electrical Features of Bi2O3 Thin Films Prepared Using Reactive Plasma Sputtering Technology 