Determination of a New Parameter, Elevated Epiretinal Membrane, by En Face OCT as a Prognostic Factor for Pars Plana Vitrectomy and Safer Epiretinal Membrane Peeling

<div>Scattergram showing the relationship between the change in corrected distance visual acuity (CDVA) and preoperative epiretinal membrane (EM) area (pixels) with no retinal contact (elevated EM). The line of best fit obtained by the least-squares fitting method is shown.</div>

Journal of Ophthalmology

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Figure 5

Figure 5: Determination of a New Parameter, Elevated Epiretinal Membrane, by En Face OCT as a Prognostic Factor for Pars Plana Vitrectomy and Safer Epiretinal Membrane Peeling 

Figure 5 | Determination of a New Parameter, Elevated Epiretinal Membrane, by En Face OCT as a Prognostic Factor for Pars Plana Vitrectomy and Safer Epiretinal Membrane Peeling 