Use of a Secondary Current Sensor in Plasma during Electron-Beam Welding with Focus Scanning for Process Control

Figure 9

Results of modeling the formation of the waveform of the secondary current in plasma when processing using a synchronous accumulation method during EBW with focus spot scanning: (a) underfocused ( = −15 mA); (b) sharp focus ( = 0 mA); (c) overfocused ( = +15 mA).

(a)

(b)

(c)