Research Article
Hydrothermal Corrosion of SiC Coupons Suppressed by Magnetron Sputtered Cr Coatings
Table 1
Deposition conditions of Cr coatings.
| | Target | Cr (99.9%) |
| | Base pressure | ~1.010-5 Pa | | Ar pressure | 0.7 Pa | | Ar gas flow rate | 32 SCCM | | Revolution speed | 12 rmp | | Cr target power (MF-DC) | 200 W | | Radio frequency (RF) | 250 W | | Substrate bias voltage (DC) | -5 V | | Deposition temperature | 400 K |
|
|