Structural Evolution of Low-Molecular-Weight Poly(ethylene oxide)-block-polystyrene Diblock Copolymer Thin Film
Figure 6
Schematic side view of the PEO-b-PS diblock copolymer with different initial thickness developed on the Si wafer under thermal annealing. A polymer brush was formed in the film of thickness less than 6.2 nm. When the film is thicker than 6.2 nm, a dense polymer brush equal to half of an interlamellar layer () was formed, and the excess material dewets this layer to form droplets. The PEO block can crystallize to form spherulite in the bigger droplets.
