Research Article
A New Type of Tri-Input TFET with T-Shaped Channel Structure Exhibiting Three-Input Majority Logic Behavior
  |  | Device parameters | Optimized values |  
  |  | Source doping profile | 1 × 1020 cm−3 (P++) |  | Drain doping profile | 1 × 1018 cm−3 (N++) |  | Body doping profile | 1 × 1014 cm−3 (N−) |  | Body thickness (TSi) | 5 nm |  | Gate length (LG) | 30 nm |  | Source length (LS) | 30 nm |  | Drain length (LD) | 30 nm |  | Gate dielectric thickness (TGD) | 3 nm |  | Work function of Gate 1 | 4.05 eV–4.11 eV |  | Work function of Gate 2 | 4.05 eV–4.11 eV |  | Work function of Gate 3 | 4.05 eV–4.11 eV |  
  |  
  |